Nanoparticles, or clusters, are first generated in the gas phase by a cluster source. Differential vacuum between source and deposition chambers enables producing an extremely intense and collimated beam of the mixture composed by clusters and inert gas. The nanoparticles beam is then “sprayed” on the substrate surface, without increasing its temperature. The high porous structure of coatings obtained by Cluster Beam Deposition makes them ideal for applications requiring high specific surface area.
Room temperature process
allowing the use of every kind of substrate (metals, ceramics, polymers, membranes, and generally micro-electro-mechanical systems), even on heat-sensitive or micromachined substrates.
High collimation of the nanoparticles beam
Precision coatings and patterning with sub-micrometric lateral resolution can be achieved by means of non-contact stencil mask, avoiding any photo-lithographic techniques.
films grow in high-purity conditions (UHV compatible process).
Nanoparticles impact on the substrate and coat the surface without major deformation, retaining their individual properties.
many degrees of freedom
The process allows many degrees of freedom in the choice of dimension and geometry of the systems, which depend only on the final applications.